In research, various technological approaches for the deposition of monocrystalline and polycrystalline diamond layers have been developed in recent years. For the production of single-crystal diamond wafers, iridium has established itself as the best starting material. It has recently been optimized for deposition on small surfaces (up to approximately 10 × 10 mm²) in combination with substrates made of magnesium peroxide (MgO₂) or strontium titanate (SrTiO₃). There is also a suitable process for producing polycrystalline diamond layers using the hot filament CVD method.
The aforementioned methods have not yet been widely used in industrial applications. The focus of current research is therefore the further enlargement of the wafer surface as well as the improved reproducibility of the process parameters. Diacara can provide you with comprehensive advice on currently available technologies and help you implement your application.